Precision-Etching SOEC interconnect plates designed for reliable gas separation, low area-specific resistance and stable operation through demanding high-temperature thermal cycles.
Inquire NowFlow fields, | ±50 μm Etching precision | Ferritic stainless Substrate selection |
Essential to SOEC stack operation. | Electrical interconnection and current distributionConnects adjacent cells and carries current through the stack while limiting resistive loss across repeated interfaces. Steam and product-gas managementEtched flow fields distribute steam and reaction gases across the active area and provide controlled routes for product-gas removal. Gas separation and structural supportMaintains separation between fuel- and oxygen-side streams while supporting sealing and plate geometry through high-temperature operation. |
How the routes compare. | An at-a-glance process comparison for thin SOEC interconnects and evolving flow fields. | ||||||||||||||||||||||||
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